Our Custom-Built Labs

Explore our research facilities, equipment and current highlights

Ultrafast Spectroscopy Lab

Setups developed with the latest generation Yb-based femtosecond lasers with unprecedented pointing and energy stability, combined with non-collinear optical parametric amplifiers (NOPA), offer to measure dynamics in sub-20 femtosecond regime.

Current highlight:

Visible range fs-TA is up and running!

Location:

Großhadern, Haus E, E3.028

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Ultrafast Spectroscopy Lab

Key equipment

  • NOPA by Prof. E. Riedle
  • Light Conversion Pharos lasers
  • Mode-locked InnoLas picolo MOPA laser
  • Vis and mid-IR Transient Absorption
  • TDCF

'Slow' Spectroscopy Lab

All setups are custom-built by group members and provide optical and electro-optical characterisation of PV devices and photocatalysts.

Current highlight:

Hamamatsu streak camera with slow sweep unit installed and operational!

Location:

Großhadern, Haus E, E3.053

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'Slow' Spectroscopy Lab

Key equipment

  • TRPL setup with streak and iCCD cameras, Coherent Chameleon Discovery (660–1320 nm) and Ekspla (210–2100 nm) lasers, and HarmoniXX SHG unit
  • Sensitive EQE and T-dependent sEQE
  • Photoinduced Absorption Spectroscopy (400 nm to 5 µm)

Organic Device Fabrication Lab

Modern platform for the fabrication of OPV devices. The lab enables the complete workflow from thin-film deposition to device fabrication and basic characterisation.

Location:

Großhadern, Haus E, E3.043

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Organic Device Fabrication Lab

Key equipment

  • Organic N₂-filled gloveboxes with spin-coater, blade-coater, and solar simulator
  • MBraun evaporator with 4 sources
  • Bruker Dektak profilometer

Electron Microscopy Lab

Electron microscopy lab operated by the groups of Prof. Laquai and Prof. Müller-Caspary.

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Electron Microscopy Lab

Key equipment

  • Titan Themis 60-300 (FEI): resolution 100 pm in TEM and 80 pm in STEM mode; ultrafast electron detector for event based and time resolved (S)TEM, 4D STEM, Timepix T4 (Quantum Detectors); EDX; tomography, heating, cooling and biasing, vacuum and cryo transfer, and more
  • Helios G3 UC (FEI): landing energy range ~100 eV – 30 keV; resolution 0.6 nm (2 kV – 30 kV); STEM possible (< 30 kV); in-situ Ga-beam preparation; site-specific TEM lamella preparation
  • Tecnai G2 20 S-Twin (FEI): TEM with LaB6 emitter, operated at 200 kV; Tietz CMOS camera (2k); EDAX EDX detector